Interference lithography is an effective and powerful tool to generate high-resolution patterning and lensless imaging for the semiconductor industry. 

The XIL-II beamline at the Swiss Light Source hosts the extreme ultraviolet (EUV) interference lithography and lensless imaging tools. The XIL-II beamline is the world’s leading photolithography tool in terms of resolution. It offers a unique infrastructure for the evaluation of photoresists for future technology nodes of the semiconductor industry.

Application sectors

Advanced materials
Chemistry
Cybersecurity

Beamlines at the swiss light source

XIL-II