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Services for Industry

High performance cleanrooms

Paid access to two high performance cleanrooms for industry research and development.

Located within the Laboratory of Micro and Nanotechnology at the Paul Scherrer Institute, the Nanotechnology Cleanroom has 170 m2 net clean area. The Process Cleanroom has 150 m2 net clean area.

Nanotechnology Cleanroom

The nanotechnology cleanroom is a professionally designed and equipped state of the art clean room lab. It has a 170 m2 net clean area and is rated as hybrid class 10/class 1000.

Available techniques:

  • Photolithography
  • Wet Etching
  • Dry Etching
  • Diffusion Furnaces
  • Metallization
  • Sample Characterization

Further equipment for sample characterisation such as SEM and AFM/STM is located outside the cleanroom labs.

Process Cleanroom

The process cleanroom is a semi-clean room of nearly 150 m2 with laminar flow boxes in the critical areas and a class 10’000 environment elsewhere.

Available equipment:

  • Two Jenoptik HEX 03 hot embossing presses for nano-imprint lithography
  • Vistec E-beam Writer
  • UHV Sputtering System
  • Photolithography Equipment
  • Wet Etching Line
  • Dry Etching

The two Jenoptik HEX 03 presses may be used for thermal imprint as well as for UV-assisted replication processes.

More information on Nanoimprint Lithography

More information on E-Beam Lithography